发明名称 |
Apparatus for processing a work piece with a uniformly neutralised ion beam |
摘要 |
<p>In order to uniformly neutralize a large current and a large diameter ion beam so as to irradiate an ion beam having a reduced beam divergence on a process target. An ion beam processing apparatus comprises an ion source (1) with an extraction electrode (6,9), a processing chamber (13) for accommodating a process target (27), and an annular microwave neutralizer (14) with an annular electrode (47) disposed around the ion beam. <IMAGE></p> |
申请公布号 |
EP0964425(A2) |
申请公布日期 |
1999.12.15 |
申请号 |
EP19990110048 |
申请日期 |
1999.05.21 |
申请人 |
HITACHI, LTD. |
发明人 |
OGURA, SATOSHI;OOISHI, SHOTARO;HASHIMOTO, ISAO;ICHIMURA, SATOSHI |
分类号 |
H05H1/46;B23K15/00;C23F4/00;H01J27/18;H01J37/08;H01L21/302;H01L21/3065;(IPC1-7):H01J27/18 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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