发明名称 Apparatus for processing a work piece with a uniformly neutralised ion beam
摘要 <p>In order to uniformly neutralize a large current and a large diameter ion beam so as to irradiate an ion beam having a reduced beam divergence on a process target. An ion beam processing apparatus comprises an ion source (1) with an extraction electrode (6,9), a processing chamber (13) for accommodating a process target (27), and an annular microwave neutralizer (14) with an annular electrode (47) disposed around the ion beam. &lt;IMAGE&gt;</p>
申请公布号 EP0964425(A2) 申请公布日期 1999.12.15
申请号 EP19990110048 申请日期 1999.05.21
申请人 HITACHI, LTD. 发明人 OGURA, SATOSHI;OOISHI, SHOTARO;HASHIMOTO, ISAO;ICHIMURA, SATOSHI
分类号 H05H1/46;B23K15/00;C23F4/00;H01J27/18;H01J37/08;H01L21/302;H01L21/3065;(IPC1-7):H01J27/18 主分类号 H05H1/46
代理机构 代理人
主权项
地址