| 发明名称 |
Resist material and pattern formation |
| 摘要 |
<p>A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.</p> |
| 申请公布号 |
EP0704762(B1) |
申请公布日期 |
1999.12.15 |
| 申请号 |
EP19950301947 |
申请日期 |
1995.03.23 |
| 申请人 |
WAKO PURE CHEMICAL INDUSTRIES, LTD;MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
URANO, FUMIYOSHI;NEGISHI, TAKAAKI;KATSUYAMA, AKIKO;ENDO, MASAYUKI |
| 分类号 |
G03F7/004;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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