发明名称 HEAT TREATMENT METHOD AND HEAT TREATMENT JIG FOR SEMICONDUCTOR WAFER
摘要 <p>PROBLEM TO BE SOLVED: To provide a heat treatment method and a heat treatment jig for facilitating handling works, such as mounting or removing, on the heat treatment jig, moreover treating a large number of wafers in a single heat treatment step. SOLUTION: A semiconductor wafer 5 is heat treated, with each of semiconductor wafers 5 hung one by one, by the use of a heat treatment jig. The heat treating jig includes a holding jig 2 with a hanging hook and two holding parts, made up of turned-up arms for holding at least two parts of the circumferential parts of the circular semiconductor wafer 5, and a supporting jig 1 for hanging the holding jig 2.</p>
申请公布号 JPH11345809(A) 申请公布日期 1999.12.14
申请号 JP19980154019 申请日期 1998.06.03
申请人 HITACHI CABLE LTD 发明人 SEKI MINORU
分类号 C30B33/00;H01L21/324;H01L21/68;H01L21/683;(IPC1-7):H01L21/324 主分类号 C30B33/00
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