| 摘要 |
<p>PROBLEM TO BE SOLVED: To miniaturize a gas supply equipment provided with a pressure type flow rate controller more, to lower a manufacture cost thereof, to prevent the occurrence of overshoot phenomenon of gas at the time of starting gas supply, to improve flow rate control accuracy and the reliability of the equipment, to reduce the dispersion of the quality of products such as semiconductors and to improve the manufacture efficiency of the products. SOLUTION: This gas supply equipment for controlling the flow rate of the gas in a state of keeping an upstream side pressure of an orifice 5 more than double or so of a downstream side pressure is constituted of a control valve 2 for receiving the gas from a gas supply source, an orifice corresponding valve 9 provided on the downstream side of the valve, a pressure detector 3 provided between the control valve and the orifice corresponding valve, the orifice provided on the downstream side of the valve mechanism part of the orifice corresponding valve and an arithmetic controller 6 for computing the flow rate from the detected pressure P1 of the pressure detector as Qc=KP1 (where K is a constant) and outputting the difference between a flow rate command signal Qs and a computed flow rate Qc to the drive part of the control valve as a control signal Qy.</p> |
