发明名称 METHOD AND DEVICE FOR RAPIDLY CHANGING ASSIST GAS PRESSURE IN LASER PROCESSING MACHINE
摘要 <p>PROBLEM TO BE SOLVED: To discharge a residual pressure in a laser processing head at high speed when the assist gas pressure changes from a high pressure to a low pressure. SOLUTION: An assist gas G is supplied into a laser processing head 9 for ejecting a laser beam to a work, and sprayed from a nozzle 27. The assist gas pressure is adjusted by a control valve 37 and supplied to the laser processing head 9. Since a rapid discharge valve 41 is provided between the control valve 37 and the laser processing head 9, at the time of changing the assist gas pressure, a little amount of the assist gas G on the primary side of the valve 41 is discharged from an discharging port 39 of the control valve 37. Thus, the pressure is sufficiently lowered so that the valve 41 can function, and the residual pressure of the head 9 on the secondary pressure side of the valve 41 is rapidly discharged by means of the valve 41.</p>
申请公布号 JPH11342489(A) 申请公布日期 1999.12.14
申请号 JP19980151583 申请日期 1998.06.01
申请人 AMADA CO LTD 发明人 SHIOJI KOMEI;YAMANASHI TAKAAKI
分类号 B23K26/14;G05D16/00;(IPC1-7):B23K26/14 主分类号 B23K26/14
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