发明名称 Methods to control the environment and exposure apparatus
摘要 An exposure apparatus includes an exposure system which transfers a pattern of a mask onto a substrate; a chamber in which the exposure system is housed; an air-conditioner which is associated with the chamber and which air-conditions the chamber; and a noise eliminating device which is arranged between the exposure system and the air-conditioner and which eliminates at least a portion of the noise components near a resonant frequency of the exposure system from noise that is generated in the air-conditioner.
申请公布号 US6002987(A) 申请公布日期 1999.12.14
申请号 US19970824467 申请日期 1997.03.26
申请人 NIKON CORPORATION 发明人 KAMIYA, SABURO;KOBAYASHI, NAOYUKI
分类号 G03F7/20;H05K7/20;(IPC1-7):G01K11/16;G03B27/52;G03B27/42 主分类号 G03F7/20
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