| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type resist compsn. for far UV excellent in dry etching resistance and exhibiting high resolving power by using a specified satd. cyclic hydrocarbon deriv. as a dissolution inhibitor. SOLUTION: The resist compsn. contains one of satd. cyclic hydrocarbon derivs. represented by (a), (b), etc., as a dissolution inhibitor, (a) is a satd. cyclic hydrocarbon alcohol obtd. by allowing a 6-16C phenol to react with a 5-25C cyclic unsatd. hydrocarbon in the presence of an acid catalyst and hydrogenating the resultant cyclic hydrocarbon-phenolic resin or an esterification or etherification product of the alcohol, and (b) is a satd. cyclic hydrocarbon alcohol obtd. by allowing a 6-16C phenol to react with a butadiene or isoprene low grade (co)polymer in the presence of an acid catalyst and hydrogenating the resultant phenolated butadiene or isoprene low grade (co)polymer or an esterification or etherification product of the alcohol. The ester group of the esterification product is represented by formula I or II. |
