发明名称 CLEANING METHOD OF GLASS SUBSTRATE FOR COLOR FILTER
摘要 <p>PROBLEM TO BE SOLVED: To effectively remove org. contaminants depositing on an ITO film or IZO film by irradiating a substrate with UV rays having a wavelength component which does not transmit through a transparent electrode pattern so as to remove the org. contaminants on the glass substrate. SOLUTION: The wavelength dependence characteristics of the transmittance of an indium oxide (In2 O3 ) film is shown in the graph with the wavelength (μm) of UV rays for irradiation as the abscissa and the transmittance (%) as the ordinate. In this graph. the transmittance of the indium oxide (In2 O3 ) film is almost 0% at <=180 nm wavelength. Namely, UV rays at <=180 nm do not transmit through a transparent electrode layer of the ITO film or IZO film. Therefore, for example, by cleaning with UV rays using a light source of 172 nm wavelength, the dye part is protected by the ITO film or IZO film. As a result, UV cleaning can be carried out without giving bad influences such as decolorization in the dye part, and since controlling the irradiation time of UV rays is not required, the cleaning power can be improved.</p>
申请公布号 JPH11337714(A) 申请公布日期 1999.12.10
申请号 JP19980118704 申请日期 1998.04.28
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 TERADA KAZUO
分类号 G02B5/20;B08B7/00;B08B7/04;G02B27/00;G02F1/1333;G02F1/1335;G09F9/00;H01L21/304;(IPC1-7):G02B5/20;G02F1/133 主分类号 G02B5/20
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