发明名称 Wafer rack support used in oven for e.g. chemical vapor deposition, contains mantle core comprising opaque quartz and transparent ceramic sleeve parts
摘要 The mantle for the support core (2) comprises at least two sleeve-shaped parts positioned on top of each other in the vertical direction, one part comprising opaque quartz and the other part comprising a transparent ceramic material. A support (9) for a wafer rack (11) or another type of object holder mountable in a vertical treatment oven (1) is provided with means in its top side for receiving the rack, and with means in its bottom side for resting it on top of the oven door panel (7). A core of insulation material extends between the top and bottom sides of the support and is surrounded by a quartz mantle. The mantle comprises at least two sleeve-shaped parts positioned on top of each other in the vertical direction, one part comprising opaque quartz and the other part comprising a transparent ceramic material. An Independent claim is also included for an oven arrangement used for high temperature treatment of substrates, containing an opening (4) in its underside closed with a door panel provided with means for receiving the wafer rack support.
申请公布号 NL1011578(C2) 申请公布日期 1999.12.10
申请号 NL19991011578 申请日期 1999.03.17
申请人 ASM INTERNATIONAL N.V. 发明人 PIETER JOHANNES QUINTUS VAN VOORST VADER;THEODORUS GERARDUS MARIA OOSTERLAKEN;FRANK HUUSSEN;MARGREET OBERTINE ANNE-MARIE VAN WIJCK;JOHANNES CORNELIS WILLEM WEIJMAN
分类号 C23C16/458;C23C16/46;C30B25/12;C30B31/14;H01L21/673;(IPC1-7):C23C16/54;H01L21/00 主分类号 C23C16/458
代理机构 代理人
主权项
地址