发明名称 |
PLASMA PROCESSING APPARATUS |
摘要 |
In the plasma processor, the microwaves generated from a microwave generator (86) are led to a plane antenna (62), which in turn introduces exponentially attenuating microwaves into a container (22) that processes an object (W) in plasma. Microwave absorption means (96) provided in the circumference of the plane antenna (62) absorbs microwaves propagating from the center of the plane antenna (62) and suppresses the reflection. As a result, the microwaves reflected in the circumference of the plane antenna (62) and returned to the center are decreased to some degree, and the electromagnetic field distribution of the microwave becomes uniform.
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申请公布号 |
WO9963586(A1) |
申请公布日期 |
1999.12.09 |
申请号 |
WO1999JP03008 |
申请日期 |
1999.06.04 |
申请人 |
TOKYO ELECTRON LIMITED;GOTO, NAOHISA;ANDO, MAKOTO;ISHII, NOBUO |
发明人 |
GOTO, NAOHISA;ANDO, MAKOTO;ISHII, NOBUO |
分类号 |
H05H1/46;C23C16/00;C23C16/511;H01J37/32;H01L21/00;H01L21/203;H01L21/3065;H05H1/00;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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