| 发明名称 |
METHOD FOR MOLDING HIGH PRECISION COMPONENTS |
| 摘要 |
A method for molding high precision components (112) is provided that allows fabrication of components (112) using a process involving a silicon substrate (100), in which the mold pattern (104 and 108) is created using multiple mask layers (102 and 106), a deep reactive ion etch process and photolithographic patterning techniques. |
| 申请公布号 |
WO9962684(A1) |
申请公布日期 |
1999.12.09 |
| 申请号 |
WO1999US12324 |
申请日期 |
1999.06.03 |
| 申请人 |
CASE WESTERN RESERVE UNIVERSITY |
发明人 |
MEHREGANY, MEHRAN;RAJAN, NARAYANAN;ZORMAN, CHRISTIAN, A. |
| 分类号 |
B29C33/42;B81C1/00;B81C99/00 |
主分类号 |
B29C33/42 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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