| 摘要 |
<p>A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, which comprises a novolac resin, a radiation-sensitive quinonediazide compound and a thioxanthone compound represented by the following formula (I): <CHEM> wherein R<1>, R<2>, R<3>, R<4>, R<5>, R<6>, R<7> and R<8> independently represent hydrogen, halogen, alkyl, alkoxy, aryl, carboxyl or alkoxycarbonyl is provided.</p> |
