发明名称 ROTARY TYPE SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To enhance a medicinal liquid recovery rate in the case a square substrate, such as glass substrate for liquid crystals, is subjected to a wet process treatment with a rotary type substrate treatment apparatus. SOLUTION: The circumference of a rotating mechanism 10 for rotating a rotor 11 is provided with a liquid recovering cup 20 of a two-stage system. This liquid recovering cup 20 is vertically moved relatively to the rotating mechanism 10, by which two kinds of the liquids splashed from the substrate 1 on the rotor 11 by rotation of the rotor 11 are separated and recovered. A liquid recovering auxiliary plate 13 consisting of a disk of nearly the same diameter as the diameter of the outer periphery of the rotating circle of the substrate 1 is disposed below the rotor 11. The liquid falling downward through the blanking hole of the rotor is received by the liquid recovering auxiliary plate 13 and is introduced into the liquid recovering cup 20 at the time of the low-speed rotation of the rotor 11.
申请公布号 JPH11333354(A) 申请公布日期 1999.12.07
申请号 JP19980145985 申请日期 1998.05.27
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 NAKADA KATSUTOSHI;MIZUKAWA SHIGERU
分类号 G02F1/1333;B05C11/08;B05C11/10;C23F1/08;G03F7/30;H01L21/306;H05K3/06;(IPC1-7):B05C11/08;G02F1/133 主分类号 G02F1/1333
代理机构 代理人
主权项
地址