发明名称 PLAIN PLATE-TYPE PLASMA TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To enable secure, effective and uniform treatment (e.g. modification) of the surface of an article to be treated by making effective use of a chemically active neutral excitation species to a maximum extent, without generating damage due to an ion or an electron. SOLUTION: This treatment device has a high voltage electrode and a grounding electrode 6 using a punching metal, both of which are plain plate-shaped and arranged opposite to each other with an insulator sandwiched in between and further has a discharge part consisting of a microspace formed between both the electrodes and the like. In addition, a mixed reaction gas is supplied in the state of a countercurrent from plural spots around both the electrodes and the like to the discharge part through slit-like gas supply holes 18A..., 18B.... This mixed reaction gas is decomposed by excitation by a glow discharge plasma to be generated following the application of a high-frequency voltage to the spaces between both electrodes and the like. Thus, a gas flow containing a chemically active neutral excitation species is generated and is applied to the surface of an article to be treated arranged oppositely to the discharge part outside thereof through plural gas flow ejection holes 3... formed on the entire surface of the grounding electrode 6.
申请公布号 JPH11333287(A) 申请公布日期 1999.12.07
申请号 JP19980149393 申请日期 1998.05.29
申请人 JAPAN SCIENCE & TECHNOLOGY CORP;PEARL KOGYO KK 发明人 SAEKI NOBORU;GOTO KOJI
分类号 H05H1/24;B01J19/08;C23G5/00;H01L21/302;H01L21/304;H01L21/3065;H05H1/46 主分类号 H05H1/24
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