发明名称 Capacitor structure of semiconductor memory cell and method for fabricating capacitor structure of semiconductor memory cell
摘要 A capacitor structure in a semiconductor memory cell includes a lower electrode formed on a base body, a capacitor insulation film which is a ferroelectric thin film formed on the lower electrode, and an upper electrode formed on the capacitor insulation film. The lower electrode is shaped semi-spherical. The capacitor structure has an increased area of the upper electrode in contact with the ferroelectric thin film, local concentration of an electric field in the ferroelectric thin film is unlikely to occur.
申请公布号 US5998825(A) 申请公布日期 1999.12.07
申请号 US19970953501 申请日期 1997.10.17
申请人 SONY CORPORATION 发明人 OCHIAI, AKIHIKO
分类号 H01L21/8247;H01L21/02;H01L21/8242;H01L27/10;H01L27/108;H01L29/788;H01L29/792;H01L29/92;(IPC1-7):H01L27/108;H01L29/76;H01L31/119 主分类号 H01L21/8247
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