发明名称 Method to monitor lens heating effects
摘要 A low cost, fast method for evaluating the effects of lens heating in a step and repeat projection system is disclosed. The first step is to form a series of photoresist images on a single substrate in the same way as would be done during normal stepping and repeating. The first few images, located centrally, will be produced by a cool lens. As more images are generated, the lens gradually heats up so that the final few images, which are placed alongside the 'cool' images, will be produced by a hot lens. Critical dimension bars are present in all image fields (at diagonally opposite corners and in the center), their size in the developed photoresist being an indication of the extent to which the focal plane has drifted. This is then used to compute correction factors for the manufacturer's scaling constants and/or to evaluate the extent, if any, of curvature of field in the projected images.
申请公布号 US5998071(A) 申请公布日期 1999.12.07
申请号 US19980048211 申请日期 1998.03.26
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 KING, MINGCHU;HUNG, CHIH-CHIEN;CHEU, SHIH-SHIUNG
分类号 G03F7/20;(IPC1-7):G03C5/00 主分类号 G03F7/20
代理机构 代理人
主权项
地址