发明名称 Generation of low work function, stable compound thin films by laser ablation
摘要 Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500 DEG C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.
申请公布号 AU4078099(A) 申请公布日期 1999.12.06
申请号 AU19990040780 申请日期 1999.05.13
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, 发明人 LONG N. DINH;WILLIAM MCLEAN;MEHDI BALOOCH;EDWARD J. FEHRING JR.;MARCUS A. SCHILDBACH
分类号 C23C14/08;C23C14/28 主分类号 C23C14/08
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