发明名称 AN APPARATUS AND METHOD FOR MEASURING A PROPERTY OF A STRUCTURE COMPRISING AT LEAST ONE LAYER
摘要 <p>An apparatus (10) for measuring a property of a structure (12) comprising at least one layer, the apparatus including a light source (14) that produces an optical pulse having a duration of less than 10 ps; a diffractive element (42) that receives the optical pulse and diffracts it to generate at least two excitation pulses (30a, 30b); an optical system (50) that spatially and temporally overlaps at least two excitation pulses on or in the structure to form an excitation pattern, containing at least two light regions, that launches an acoustic wave having an out-of-plane component (87) that propagates through the layer (79), reflects off a lower boundary (83) of the layer, and returns to a surface (89) of the structure to modulate a property of the structure; a light source (14) that produces a probe pulse (32) that diffracts off the modulated property to generate at least one signal pulse (54a, 54b); a detector (63) that receives at least one signal pulse and in response generates a light-induced electrical signal; and an analyzer that analyzes the ligth-induced electrical signal to measure the property of the structure.</p>
申请公布号 WO1999061867(A1) 申请公布日期 1999.12.02
申请号 IB1999000959 申请日期 1999.05.27
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