发明名称 |
Contour preparing for PN-junctions in semiconductor bodies |
摘要 |
Contacts (6) are formed on the semiconductor body and the surface is covered with a chemically resistant layer (2). The body is split vertically through the polar regions to form cross-sections. Controllable voltage sources are coupled to the electric contacts. The body is then etched by a concentration-selective chemical solution under applied voltages. Images of the etched regions are taken by electron microscope and stored. The boundary contour between etched and non-etched region is evaluated.
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申请公布号 |
DE19825399(A1) |
申请公布日期 |
1999.12.02 |
申请号 |
DE19981025399 |
申请日期 |
1998.05.27 |
申请人 |
INSTITUT FUER HALBLEITERPHYSIK FRANKFURT (ODER) GMBH |
发明人 |
GAWORZEWSKI, PETER;METHFESSEL, MICHAEL |
分类号 |
G01N1/32;H01L21/66;(IPC1-7):H01L21/66;H01L21/306 |
主分类号 |
G01N1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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