发明名称 Contour preparing for PN-junctions in semiconductor bodies
摘要 Contacts (6) are formed on the semiconductor body and the surface is covered with a chemically resistant layer (2). The body is split vertically through the polar regions to form cross-sections. Controllable voltage sources are coupled to the electric contacts. The body is then etched by a concentration-selective chemical solution under applied voltages. Images of the etched regions are taken by electron microscope and stored. The boundary contour between etched and non-etched region is evaluated.
申请公布号 DE19825399(A1) 申请公布日期 1999.12.02
申请号 DE19981025399 申请日期 1998.05.27
申请人 INSTITUT FUER HALBLEITERPHYSIK FRANKFURT (ODER) GMBH 发明人 GAWORZEWSKI, PETER;METHFESSEL, MICHAEL
分类号 G01N1/32;H01L21/66;(IPC1-7):H01L21/66;H01L21/306 主分类号 G01N1/32
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