CLEANING FLUID AND CLEANING METHOD FOR COMPONENT OF SEMICONDUCTOR-TREATING APPARATUS

摘要

A cleaning fluid which is used for removing a by-product deposit derived from products of the decomposition of a treatment gas comprising carbon and fluorine from a component of a semiconductor-treating apparatus. The detergent comprises 75 wt.% N-methyl-2-pyrrolidone, 15 wt.% ethylene glycol monobutyl ether, 0.5 wt.% surfactant, and 9.5 wt.% water. It is regulated so as to have an alkali metal content lower than 10 ppb.