Chemically amplified resist for electron beam lithography,申请号EP19980121532-传众专利搜索

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发明名称	Chemically amplified resist for electron beam lithography
摘要
申请公布号	EP0919867(A3)	申请公布日期	1999.12.01
申请号	EP19980121532	申请日期	1998.11.17
申请人	SIEMENS AKTIENGESELLSCHAFT	发明人	ELIAN, KLAUS DR.;GUENTHER, EWALD DR.;LEUSCHNER, RAINER DR.
分类号	G03F7/004;G03F7/039;G03F7/075;G03F7/40;H01L21/027;(IPC1-7):G03F7/004	主分类号	G03F7/004
代理机构		代理人
主权项
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