| 发明名称 |
CMP SLURRY CONTAINING A SOLID CATALYST |
| 摘要 |
<p>A chemical mechanical polishing composition comprising an oxidizing agent an d at least one solid catalyst, the composition being useful when combined with an abrasive or with an abrasive pad to remove multiple metal layers from a substrate.</p> |
| 申请公布号 |
CA2336482(A1) |
申请公布日期 |
1999.12.02 |
| 申请号 |
CA19992336482 |
申请日期 |
1999.05.25 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
MUELLER, BRIAN L.;WANG, SHUMIN |
| 分类号 |
B24B37/04;C09G1/02;C09K3/14;C23F3/00;H01L21/321;(IPC1-7):C09G1/02 |
主分类号 |
B24B37/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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