Photoresist composition

摘要

A photoresist composition comprises as a uniform blend: (A) 100 parts by weight of a film-forming resinous compound which is, in the presence of an acid, subject to a change in solubility in an alkaline solution; and (B) from 0.1 to 30 parts by weight of an oxime sulfonate compound represented by the general formula NC-CR<1>=N-O-SO2-R<2>, in which R<1> and R<2> are, each independently from the other, a non-aromatic monovalent group.