发明名称 NEGATIVE PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING A PATTERN AND ELECTRONIC PARTS
摘要 A negative photosensitive polymer composition, which comprises a thermosetting polymer precursor which can be cured through cyclodehydration upon heating, and a photosensitive heat cure accelerator which is capable of accelerating a curing upon irradiation of light (cyclodehydration accelerating property). This photosensitive heat cure accelerator may be a compound which is capable of increasing molecular weight and raising volatilization temperature upon irradiation of light, or a compound which is capable of generating a carboxyl group upon irradiation of light thereby exhibiting a heat cure-accelerating property, and is formed of an aromatic hydrocarbon or aromatic heterocyclic compound having at least one hydroxyl group, substituted or unsubstituted amino group or mercapto group.
申请公布号 KR100232662(B1) 申请公布日期 1999.12.01
申请号 KR19970006943 申请日期 1997.03.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MACHIDE, SHIGERU;KAWAMONJEN, YOSIAKI;OBA, MASAYUKI
分类号 G03F7/004;C08G73/10;C08K5/04;C08K5/16;C08K5/34;C08K5/36;C08K5/51;C08L79/04;C08L79/08;C08L101/00;C09K9/00;G03F7/028;G03F7/037;G03F7/038;G03F7/38;H01L21/027 主分类号 G03F7/004
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