发明名称 |
NEGATIVE PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING A PATTERN AND ELECTRONIC PARTS |
摘要 |
A negative photosensitive polymer composition, which comprises a thermosetting polymer precursor which can be cured through cyclodehydration upon heating, and a photosensitive heat cure accelerator which is capable of accelerating a curing upon irradiation of light (cyclodehydration accelerating property). This photosensitive heat cure accelerator may be a compound which is capable of increasing molecular weight and raising volatilization temperature upon irradiation of light, or a compound which is capable of generating a carboxyl group upon irradiation of light thereby exhibiting a heat cure-accelerating property, and is formed of an aromatic hydrocarbon or aromatic heterocyclic compound having at least one hydroxyl group, substituted or unsubstituted amino group or mercapto group. |
申请公布号 |
KR100232662(B1) |
申请公布日期 |
1999.12.01 |
申请号 |
KR19970006943 |
申请日期 |
1997.03.03 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
MACHIDE, SHIGERU;KAWAMONJEN, YOSIAKI;OBA, MASAYUKI |
分类号 |
G03F7/004;C08G73/10;C08K5/04;C08K5/16;C08K5/34;C08K5/36;C08K5/51;C08L79/04;C08L79/08;C08L101/00;C09K9/00;G03F7/028;G03F7/037;G03F7/038;G03F7/38;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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