发明名称 FORMING METHOD OF THIN FILM SOLAR BATTERY CELL PATTERN
摘要 PROBLEM TO BE SOLVED: To cut down the production cost, by a method wherein a metallic electrode is coated with magnesium oxide by printing method, and then amorphous silicon layer is deposited on the magnesium oxide to eliminate the mask manufacturing and replacing operations. SOLUTION: A metallic thin layer 12 is formed on the whole surface of a glass substrate 11, and then the metallic thin layer 12 is patterned by photolithography so that the positions wherefrom amorphous silicon thin film is to be removed may be coated with magnesium hydroxide fine grain sol in fine trench shape traversing the substrate 11 to be dried up for the formation of MgO layer patterns 13, whereon an amorphous silicon layer 14 and a transparent conductive film 15 are successively formed. Finally, a passivation film 6 is formed on the whole surface by vacuum forming process so as to complete a thin film solar battery cell pattern. Through these procedures, the step numbers can be cut down, thereby making feasible of reducing the production cost.
申请公布号 JPH11330510(A) 申请公布日期 1999.11.30
申请号 JP19980153609 申请日期 1998.05.18
申请人 DAINIPPON PRINTING CO LTD 发明人 HAOTO DAISAKU;DAITO RYOICHI;ICHIMURA KOJI
分类号 H01L31/04 主分类号 H01L31/04
代理机构 代理人
主权项
地址