| 摘要 |
PROBLEM TO BE SOLVED: To provide a waste water separately recovering device in a one-tank wafer cleaning unit of a single wafer processing type which able to separately recover chemical from waste water and to separate waste rinse into contaminated waste rinse and clean waste rinse to recover them separately. SOLUTION: Waste chemical lines 15, 16 and a waste rinse line 17, which are connected to a processing tank have automatic distribution valves 10, 11, 12 for selecting chemical/rinse, respectively. The waste rinse line 17 is provided with a concentration sensor 18 for detecting the concentration of waste rinse after the automatic distribution valve 12 and is branched into a contaminated waste rinse line 17a and a clean waste rinse line 17b after the concentration sensor 18. The waste rinse lines 17a and 17b are provided with automatic distribution valves 13, 14 for contaminated rinse and clean rinse, respectively, which are opened based on the detection signal of the concentration sensor 18 for separating the contaminated waste rinse from the clean waste rinse.
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