LOW PRESSURE CHEMICAL VAPOR DEPOSITION APPARATUS,申请号JP19980155274-传众专利搜索

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发明名称	LOW PRESSURE CHEMICAL VAPOR DEPOSITION APPARATUS
摘要
申请公布号	JPH11329985(A)	申请公布日期	1999.11.30
申请号	JP19980155274	申请日期	1998.05.19
申请人	TOKIN CORP	发明人	NEMOTO MICHIO
分类号	C23C16/44;C23C16/455;H01L21/205;(IPC1-7):H01L21/205	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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