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发明名称
METHOD FOR ETCHING LAMINATED FILM OF OXIDE FILM AND SILICON LAYER
摘要
申请公布号
JPH11330045(A)
申请公布日期
1999.11.30
申请号
JP19980126375
申请日期
1998.05.08
申请人
NEC CORP
发明人
MANSEI AKIRA
分类号
C23F4/00;H01L21/302;H01L21/3065;H01L21/311;H01L21/3213;(IPC1-7):H01L21/306
主分类号
C23F4/00
代理机构
代理人
主权项
地址
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