APPARATUS FOR PROCESSING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To minimize foot print and to simplify a control mechanism, when carrying a substrate between processing parts and to arrange the mechanism in a directly in-line relation with an outer peripheral unit. SOLUTION: This device has a first processing group and a second processing group whose cleaning part and drying part are arranged in the vertical direction (in a z-direction) and has a first carrying robot TR1 and a second carrying robot TR2 as mechanisms for carrying a substrate. The first carrying robot TR1 carries a substrate W for a pod 9a arranged in a substrate storage 7 and the drying part and the substrate placing part 82 of the first processing group MP1 and the second processing group MP2. The first carrying robot TR1 makes an another access to a buffer 72, and the second carrying robot TR2 has access to a CMP unit 200 which is an outer peripheral unit.