发明名称 MANUFACTURE OF N-TYPE ZNTE SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide the method for manufacturing an n-type ZnTe semiconductor of low resistivity with good reproducibility, and provide an electrode material which is superior in ohmic contact with the n-type ZnTe semiconductor of low resistivity. SOLUTION: In a method for manufacturing an n-type ZnTe semiconductor on a substrate by making Zn raw gas, Te raw gas and Al doping gas or Cl doping gas react by an organic metal vapor growth method, the raw gas is supplied so that mole ratio of Zn and Te accounted in the raw gas is Te/Zn>=1.1 or Te/Zn<=0.9. Furthermore, an n-type ZnTe semiconductor element having good ohmic contact can be obtained, by forming a W electrode or an In alloy electrode containing Hg on the n-type ZnTe semiconductor.
申请公布号 JPH11330098(A) 申请公布日期 1999.11.30
申请号 JP19980125557 申请日期 1998.05.08
申请人 UNIV SAGA 发明人 OGAWA HIROSHI
分类号 H01L21/28;H01L21/365;H01L31/04;H01L31/10;H01L33/28;H01L33/40 主分类号 H01L21/28
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