发明名称 METHOD AND APPARATUS FOR MEASURING POSITION, AND ALIGNER
摘要 <p>PROBLEM TO BE SOLVED: To provide an aligner, a method and an apparatus which makes it possible to take high-precision measurement of the position of an XY stage even take by a plane mirror having a length shorter than a moving stroke, and to realize cost reduction and a high control performance of the stage. SOLUTION: Since second light-wave interferometers (LY1 , LY2 ) for measuring the coordinate position Y of a stage relating to the second position (y-direction) are switched over, and a measuring position in the first direction is switched over, in accordance with the coordinate position X of the stage 8 relating to a first direction (x-direction) measured on the basis of the output of a first light wave interferometer LX, high-precision position measurement in the second direction becomes feasible, even if a reflecting surface RY shorter than the first-direction moving stroke of the stage is used. Furthermore, it is possible to reduce the cost of the apparatus and to make the performance of movement control of time stage higher, by shortening the reflecting surface.</p>
申请公布号 JPH11325832(A) 申请公布日期 1999.11.26
申请号 JP19980137210 申请日期 1998.05.19
申请人 NIKON CORP 发明人 SAEKI KAZUAKI
分类号 G01B11/00;G03F7/20;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):G01B11/00 主分类号 G01B11/00
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