Device for Hybrid Plasma Processing

摘要

A device for hybrid plasma processing, particularly for deposition of thin films and for plasma treatment of samples, in a plasma reactor with pumping system characterized in that at least one feeder of microwave power ( 2 ) is installed in the plasma reactor ( 1 ) and connected to a microwave generator ( 3 ) for generation of a microwave plasma ( 4 ) in contact with at least one hollow cathode ( 5 ) in the plasma reactor, where the hollow cathode is powered from a cathode power generator ( 6 ). At least one inlet for a processing gas ( 7 ) is installed behind the hollow cathode and the gas is admitted into the plasma reactor through the hollow cathode where a hollow cathode plasma ( 9 ) is generated. A magnetic element ( 10 ) is used for generation of a perpendicular magnetic field ( 11 ) and/or a longitudinal magnetic field ( 12 ) at an outlet ( 13 ) from the hollow cathode.