Malonate dissolution inhibitor for use in photolithography

摘要

A new dissolution inhibitor of a chemically amplified photoresist features an acid-labile dialkylmalonate group combined as a functional group with a 1-40C hydrocarbon. An Independent claim is included for a chemically amplified photoresist composition comprising: (a) a photosensitive polymer; (b) a photosensitive acid generator; and (c) a dissolution inhibitor where an acid-labile dialkylmalonate group is combined as a functional group with a 1-40C hydrocarbon.