| 摘要 |
Negative resist composition, which can be developed in a basic aqueous solution, comprises a film-forming polymer (I) with an alkali-soluble group, which is soluble in a basic aqueous solution, a compound (II) with an allyl alcohol structure and a photo acid generator (III), which converts (II) to a protective group for the alkali-soluble group when decomposed by exposure to imaging radiation.
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