发明名称 |
Multicolumn electron-beam lithography system |
摘要 |
A control unit (60) has a common processor (73) for controlling the parts of the processing common to all the columns (80a, b). Individual processors (71, 72) for each column control the parts of the processing specific to that column. These individual processors adjusts the time lags occurring when the columns perform common processing so that this is performed synchronously by all the columns.
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申请公布号 |
DE19922545(A1) |
申请公布日期 |
1999.11.25 |
申请号 |
DE19991022545 |
申请日期 |
1999.05.10 |
申请人 |
ADVANTEST CORP., TOKIO/TOKYO |
发明人 |
ENOMOTO, KOJI |
分类号 |
G03F7/20;H01J37/147;H01J37/20;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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