| 摘要 |
The invention relates to an intra-osseous implant for introducing into a bone. The surface of the inventive implant has a specific roughness and comprises recesses (1) of a depth (c) of approximately 20 mu m to approximately 60 mu m. Bottom surfaces (2) are situated at the base of the recesses (1) and plateau surfaces (3) are located between the recesses (1). Said bottom surfaces (2) and plateau surfaces (3) have a horizontal extension (a, b) of approximately 10 mu m to approximately 20 mu m. These recesses (1) are ideally as smooth as possible, i.e. they do not show any surface roughness smaller than the cellular dimension. Side faces (4) extending from the bottom surface (2) extend up to the plateau surfaces (3) at an angle, the angle ( alpha ) of inclination between the horizontal lines and the side faces (4) being equal to approximately 30 DEG at the most. The implant is provided with a self-tapping thread underneath its upper neck portion, said neck portion being coated with a porcelain-type covering. The surface energy and potential of the implant are kept as low as possible. The preferred materials for producing such implants include titanium, titanium based alloys and porcelain type materials. As a result of this surface structure, the implant is characterised by strong primary stability immediately after implantation and by accelerated and increased capacity due to more intensive osseous integration. |
