发明名称 AN AUTOMATED SUBSTRATE PROCESSING SYSTEM
摘要 A substrate handling apparatus includes a transfer arm having a substrate support. The apparatus includes at least one image acquisition sensor configured to acquire images of a substrate supported by the substrate support. In addition, the apparatus includes a controller coupled to the image acquisition sensor and configured to control the image acquisition sensor to acquire at least one image of the substrate supported on the substrate support. The controller is further configured to receive the images acquired by the image acquisition sensor and to determine an initial position of the substrate based on the acquired images. The controller is further coupled to the substrate support to control movement thereof to move the substrate to a new position based on the substrate's initial position. The apparatus also can be used to determine a substrate idenfication and to detect certain substrate defects either before or after processing the substrate in a thermal processing chamber. A method of positioning a substrate on a transfer arm also is disclosed.
申请公布号 WO9960610(A1) 申请公布日期 1999.11.25
申请号 WO1999IB01251 申请日期 1999.05.13
申请人 APPLIED KOMATSU TECHNOLOGY, INC. 发明人 BEER, EMANUEL;WHITE, JOHN, M.
分类号 B25J9/16;B65G49/06;H01L21/02;H01L21/677;H01L21/68;(IPC1-7):H01L21/00 主分类号 B25J9/16
代理机构 代理人
主权项
地址