| 摘要 |
A light-sensitive silver halide photographic material and a method for preparing said material is provided, wherein said material comprises a support and on one or both sides thereof at least one silver halide emulsion layer and a protective antistress layer as an outermost layer, characterized in that said silver halide emulsion layer(s) and/or said protective antistress layer comprise(s) at least one zeolite loaded with a photographically useful group. Said photographically useful group is a soluble salt, an organic compound releasing chloride, bromide or iodide, a sulfur salt, a selenium salt, a tellurium salt and/or a metal salt of group VIII. Further a method of preparing said light-sensitive silver halide photographic material as described hereinbefore is provided, said method comprising the steps of precipitating silver halide crystals in a colloidally stable aqueous medium by mixing an aqueous silver salt solution and at least one halide solution thereby forming an emulsion; flocculating, followed by decanting, washing and redispersing said emulsion or washing said emulsion by dialysis or ultrafiltration followed by adding one or more colloidally stable solution(s); chemically ripening said silver halide crystals in said emulsion, adding thereto solutions comprising chemical ripening agents; adding coating solutions comprising coating additives, followed by coating and drying, wherein in at least one of said steps at least one zeolite is added to the said medium, solution or emulsion.
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