| 摘要 |
The present invention provides an apparatus and associated method of detecting pattern unevenness in the surface of an object. The apparatus includes a light source for irradiating surfaces of an object and a line sensor camera for detecting unevenness in the surfaces. The method comprises the steps of irradiating a light onto a surface having a pattern formed on the surface thereof, and observing the scattered light from the pattern edge portions, thereby inspecting pattern unevenness by way of the line sensor camera.
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