发明名称 Conductive metal oxide film and method of making
摘要 The present invention is a method for reducing a dopant in a film of a metal oxide wherein the dopant is reduced and the first metal oxide is substantially not reduced. The method of the present invention relies upon exposing the film to reducing conditions for a predetermined time and reducing a valence of the metal from a positive valence to a zero valence and maintaining atoms with a zero valence in an atomic configuration within the lattice structure of the metal oxide. According to the present invention, exposure to reducing conditions may be achieved electrochemically or achieved in an elevated temperature gas phase.
申请公布号 US5990416(A) 申请公布日期 1999.11.23
申请号 US19980061827 申请日期 1998.04.16
申请人 BATTELLE MEMORIAL INSTITUTE 发明人 WINDISCH, JR., CHARLES F.;EXARHOS, GREGORY J.
分类号 H01L31/18;(IPC1-7):H01L25/00 主分类号 H01L31/18
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