发明名称 Ferroelectric memory
摘要 A contact hole is formed in a protective film 9 so as to communicate with an upper electrode 15. In the contact hole is formed a conductor 13 made of substantially the same material as used for the upper electrode 15, so as to communicate with the upper electrode 15 and extend to the outside of the contact hole. The conductor 13 is electrically connected to a memory cell transistor, by a wiring layer 14.
申请公布号 US5990508(A) 申请公布日期 1999.11.23
申请号 US19980095055 申请日期 1998.06.10
申请人 NEC CORPORATION 发明人 SHINOHARA, SOTA
分类号 H01L21/8247;H01L21/02;H01L21/768;H01L21/8242;H01L21/8246;H01L27/10;H01L27/105;H01L27/108;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L29/72 主分类号 H01L21/8247
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