发明名称 STRUCTURES AND COMPONENTS THEREOF HAVING A DESIRED SURFACE CHARACTERISTIC TOGETHER WITH METHODS AND APPARATUSES FOR PRODUCING THE SAME
摘要 Methods and apparatus for plasma modifying a substrate are disclosed along with associated techniques for applying coatings to the substrate. Particular utility has been found using a hollow cathode to generate the plasma along with magnetic focusing means to focus the plasma at the surface of a substrate.
申请公布号 WO9958757(A1) 申请公布日期 1999.11.18
申请号 WO1999US10149 申请日期 1999.05.08
申请人 ASTEN, INC. 发明人 YIALIZIS, ANGELO;ELLWANGER, RICHARD, E.;MIKHAEL, MICHAEL, G.;DECKER, WOLFGANG;JOHNSON, C., BARRY;SHIPLEY, GALE;O'BRIEN, TIMOTHY, D.
分类号 D06M10/02;D06M14/26;D06M14/32;(IPC1-7):D06M10/02 主分类号 D06M10/02
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