发明名称 DIRECTED ENERGY ASSISTED IN VACUO MICRO EMBOSSING
摘要 Various configurations of a directed energy assisted micro embossing machine/station in a vacuum chamber (7) utilized in a continuous manufacturing process and the web structure products (4) made by that process (optical disks, cards, tapes, holographic reflectors, diffusers, binary optical elements, etc.) are disclosed. The configurations can include a single machine roll to roll system (2, 3) for embossing optical features on the surface of a single substrate (4) and applying appropriate metallic, dielectric, semiconductor, polymer and other coatings all in a vacuum chamber (7).
申请公布号 WO9958327(A1) 申请公布日期 1999.11.18
申请号 WO1999US09923 申请日期 1999.05.05
申请人 KIME, MILFORD, B. 发明人 KIME, MILFORD, B.
分类号 B29C35/08;B29C35/10;B29C39/14;B29C59/04;G02B5/18;G02B5/32;G03F7/00;G03H1/02;G03H1/18;G11B7/26;(IPC1-7):B32B3/00;B29D11/00 主分类号 B29C35/08
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