| 摘要 |
Crystal growth apparatus comprising a crucible for containing a supply of molten material from which the crystal may be grown and first reflection mea ns for receiving radiation directed along an input path and reflecting radiatio n towards second reflection means, whereby the second reflection means reflect output radiation along an output path. The first and second reflection means are arranged at or in close proximity with the surface of the molten materia l such that during crystal growth they maintain a substantially constant position relative to the surface of the molten material. The apparatus may comprise support means for supporting the first and second reflection means, whereby the support means are arranged to float on the molten material. The apparatus may be a single crucible apparatus or a double crucible apparatus. In the double crucible apparatus, the support means may be a second, inner crucible containing molten material in fluid communication with the molten material in the first crucible, whereby the inner crucible floats on the molten material in the first crucible and the first and second reflection means are supported on the inner crucible. The apparatus may also comprise image processing means for forming an image of the crystal or any part of th e growth interface region and for determining crystal diameter measurement or meniscus diameter measurement during growth. The apparatus may also comprise means for controlling growth of the crystal in response to the measured crystal or meniscus region diameter. The invention also relates to a crucibl e for use in growing crystals and a crystal growth method. |
