发明名称 THIN FILM FORMING METHOD AND THIN FILM FORMING APPARATUS
摘要 In the step of forming a thin film on an object in a low pressure atmosphere, while continuously forming a thin film on a long sheet-like object, the Raman spectrum is continuously measured in-line, and the thin film forming conditions are controlled according to the results of the measurement of the Raman spectrum. When the Raman spectrum is measured, the probe of the Raman spectroscope is focus-controlled relative to the object, or the output of the laser of the Raman spectroscope is controlled. The thin film is, for example, a protective film of a magnetic recording medium, and the protective film is, for example, a hard carbon film (DLC film).
申请公布号 WO9958740(A1) 申请公布日期 1999.11.18
申请号 WO1999JP02535 申请日期 1999.05.14
申请人 SONY CORPORATION;AMANO, SHUNJI;HAYASHI, HIROSHI;HIRATSUKA, RYOICHI 发明人 AMANO, SHUNJI;HAYASHI, HIROSHI;HIRATSUKA, RYOICHI
分类号 C23C14/54;C23C16/52;G01N21/65;G01N21/84;G11B5/72;G11B5/84 主分类号 C23C14/54
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