| 摘要 |
<p>A mirror projection system for use in a step-and-scan lithographic projection apparatus, in which a mask pattern (15) is repetitively scan-imaged on a number of areas of a substrate (20) by means of a beam (b) of EUV radiation, and having a cross section shaped as a segment of a ring, has six imaging mirrors (5-10). The design is such that an intermediate image is formed between the fourth (8) and the fifth mirror (9) from the object side (1), and the system has a relatively large working distance (c).</p> |
