发明名称 Semiconductor sensor for a dynamic parameter, e.g. an accelerometer manufacture method
摘要 The method involves producing a semiconducting substrate (14) with first (14b) and second (14a) semiconducting regions separated by an insulating layer (14c). A movable part is formed in the first semiconducting region by etching both semiconducting regions. The movable part is defined in a step whereby it is formed in a gas phase atmosphere following etching in both semiconducting regions. An Independent claim is also included for a semiconducting sensor for a dynamic parameter.
申请公布号 DE19921241(A1) 申请公布日期 1999.11.11
申请号 DE1999121241 申请日期 1999.05.07
申请人 DENSO CORP., KARIYA 发明人 MUTO, HIROSHI;FUKADA, TSUYOSHI;TERADA, MASAKAZU;SUGITO, HIROSHIGE;KANOSUE, MASAKAZU;YOSHIHARA, SHINJI;OZOE, SHOJI;FUJINO, SEIJI;SAKAI, MINEKAZU;MURATA, MINORU;TAKEUCHI, YUKIHIRO;AOYAMA, SEIKI;YAMAMOTO, TOSHIO;ASAMI, KAZUSHI
分类号 B81B3/00;B81C1/00;G01P15/08;G01P15/125 主分类号 B81B3/00
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