发明名称
摘要 An apparatus continuously manufactures a semiconductor device. A plurality of glow discharge regions are connected by gas gates. An enough long belt-shaped substrate having a desired width is arranged along a path in which the substrate sequentially penetrates the glow discharge regions. The belt-shaped substrate is continuously conveyed in a longitudinal direction while depositing a semiconductor layer of a conductivity type which is needed in each of the glow discharge regions, thereby continuously manufacturing the device having a semiconductor junction. A plurality of rotatable rollers are arranged in a slit-shaped separating passage of the gas gates so as to support the back surface of the belt-shaped substrate while rotating the rollers.
申请公布号 JP2975151(B2) 申请公布日期 1999.11.10
申请号 JP19910087420 申请日期 1991.03.28
申请人 KYANON KK 发明人 FUJIOKA YASUSHI;YOSHINO TOSHIHITO;SANO MASAFUMI;KODA JUZO;KANAI MASAHIRO;KUROKAWA TAKESHI
分类号 H01L21/205;C23C16/507;C23C16/54;H01L31/04 主分类号 H01L21/205
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