发明名称 |
Waste treatment system in a polishing apparatus |
摘要 |
<p>A waste treatment system in a polishing apparatus treates waste gas and waste liquid discharged from the polishing apparatus. The waste treatment system comprises an exhaust duct provided in a partition wall enclosing the polishing apparatus, a scrubber connected to the exhaust duct through an exhauster for scrubbing waste gas discharged from the polishing apparatus, a waste liquid receiver provided below an abrasive cloth of the polishing apparatus for receiving waste liquid generated by polishing operation and a waste liquid treatment apparatus connected to the waste liquid receiver for treating the waste liquid discharged from the polishing apparatus.</p> |
申请公布号 |
EP0639534(B1) |
申请公布日期 |
1999.11.10 |
申请号 |
EP19940112772 |
申请日期 |
1994.08.16 |
申请人 |
EBARA CORPORATION |
发明人 |
KIMURA, NORIO;AOKI, KATSUYUKI;KAWASHIMA, KIYOTAKA;ISHIKAWA, SEIJI |
分类号 |
B01D53/14;B01D53/50;B01D53/58;B24B55/03;C02F1/52;(IPC1-7):C02F1/52;B01D53/34 |
主分类号 |
B01D53/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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