发明名称 POLISHING APPARATUS
摘要 A compact polishing apparatus (30) can produce a high degree of flatness and cleanliness in the polished object. The polishing apparatus (30) comprises a polishing table having an abrading plate (59), a pressing device (32) for forcing a work surface of a workpiece (1) against an abrading surface (59) of the abrading plate. A driving device is provided for making the abrading surface (59) and the work surface undergo a relative circulative translation motion tracing a given pattern.
申请公布号 EP0954408(A1) 申请公布日期 1999.11.10
申请号 EP19980954788 申请日期 1998.11.20
申请人 EBARA CORPORATION 发明人 SHIMIZU, NOBURU;KIMURA, NORIO
分类号 B08B1/04;B24B37/07;B24B37/10;H01L21/306 主分类号 B08B1/04
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