发明名称 |
POLISHING APPARATUS |
摘要 |
A compact polishing apparatus (30) can produce a high degree of flatness and cleanliness in the polished object. The polishing apparatus (30) comprises a polishing table having an abrading plate (59), a pressing device (32) for forcing a work surface of a workpiece (1) against an abrading surface (59) of the abrading plate. A driving device is provided for making the abrading surface (59) and the work surface undergo a relative circulative translation motion tracing a given pattern. |
申请公布号 |
EP0954408(A1) |
申请公布日期 |
1999.11.10 |
申请号 |
EP19980954788 |
申请日期 |
1998.11.20 |
申请人 |
EBARA CORPORATION |
发明人 |
SHIMIZU, NOBURU;KIMURA, NORIO |
分类号 |
B08B1/04;B24B37/07;B24B37/10;H01L21/306 |
主分类号 |
B08B1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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